ADI's data acquisition solution shines in advanced lithography chip manufacturing
and edge computing. Advanced processes and innovative control systems are required to meet the ever-decreasing size requirements of semiconductors with circuits as narrow as one-ten-thousandth the width of a human hair. Lithography is a cornerstone technology in semiconductor manufacturing that enables the precise patterning of features on silicon and other substrate wafers to create ICs. It utilizes photomasks and powerful, extremely accurate light beams or radiation to transfer the details of a chip's design pattern onto wafers, which are coated with photoresist material. The photoresist reacts to the light, and the wafer is treated with chemicals to etch the circuit pathways in the wafer substrate. Multiple photomasks are utilized in a layering process. The highly specialized and extremely complex lithography semiconductor manufacturing systems are produced by a very small number of companies able to undertake the technical challenges and fund the expensive R&D needed for continued innovation in this field.
hundreds of millions of dollars, the company's most advanced systems now enable the production of chips with feature sizes smaller than 2 nm, providing more transistors per chip and smaller spacing between transistors. It also supplies deep ultraviolet (DUV) systems that utilize longer wavelengths suitable for more cost-effective production of mid-range and legacy layers on chips manufactured at 14 nm, 28 nm, and larger nodes. Other lithography semiconductor manufacturing systems are produced by Canon and Nikon, which focus on DUV lithography and legacy technologies for manufacturing less advanced nodes used in MEMS, power semiconductors, and industrial applications.
■ Position sensors measure the exact position of wafers, photomasks, and lenses ■ Vibration sensors detect and compensate for vibrations that can disturb alignment ■ Environmental sensors monitor temperature, humidity, and air quality to minimize environmental influences on precision ■ Force and strain sensors ensure actuators apply the correct forces during alignment and positioning Sensors provide the essential real- time data for closed-loop feedback to adjust actuators dynamically, ensuring alignment and pattern accuracy. They detect deviations in real time to prevent defects in patterned wafers and perfect alignment of the photomask and wafer, which is crucial for multi-layer chip designs. They are also critical for minimizing delays caused by misalignments or rework. Interaction of sensors and actuators DUV and EUV lithography systems both rely on tens of thousands of sensors to achieve the precision and reliability essential for efficient, high-yield semiconductor manufacturing. As equipment
Achieving extreme precision
Lithography processes require extreme precision to achieve sub-micron scale patterns. Sensors and actuators are critical to maintain precision and yield, enabling continued technological advances in the development of smaller, more potent, and energy- efficient semiconductors. Sensors play a pivotal role in actuator control, providing real- time feedback, error correction, and environmental compensation:
ASML is the industry leader, dominating the advanced lithography market with its
exclusive, cutting-edge extreme ultraviolet (EUV) systems, which are essential for producing the most advanced chips. Costing up to
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